Radiation tolerance study of a commercial 65nm CMOS technology for high energy physics applications
Articolo
Data di Pubblicazione:
2016
Citazione:
(2016). Radiation tolerance study of a commercial 65nm CMOS technology for high energy physics applications [journal article - articolo]. In NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. SECTION A, ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT. Retrieved from http://hdl.handle.net/10446/187022
Abstract:
This paper reports the radiation tolerance study of a commercial 65 nm technology, which is a strong candidate for the Large Hadron Collider applications. After exposure to 3 MeV protons till 1 Grad dose, the 65 nm CMOS transistors, especially the pMOSFETs, showed severe long-term degradation mainly in the saturation drain currents. There were some differences between the degradation levels in the nMOSFETs and the pMOSFETs, which were likely attributed to the positive charges trapped in the gate spacers. After exposure to heavy ions till multiple strikes, the pMOSFETs did not show any sudden loss of
drain currents, the degradations in the characteristics were negligible.
Tipologia CRIS:
1.1.01 Articoli/Saggi in rivista - Journal Articles/Essays
Elenco autori:
Ding, Lili; Gerardin, Simone; Bagatin, Marta; Bisello, Dario; Mattiazzo, Serena; Paccagnella, Alessandro
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